The photochemistry of trifluoronitromethane adsorbed on sublimated alkali halide films was investigated using infrared spectroscopy. Spectra were acquired of CF3NO2 adsorbed onto films of potassium chloride, potassium bromide, and sodium bromide at 80 K and high vacuum conditions. Vibrational frequencies of the adsorbate were compared to gas phase values and the differences noted. Photolysis of the sample at 12 K with a hydrogen lamp produced the decomposition product CF2O, identified by spectral analysis. Desorption data were collected as the temperature was incrementally raised, and rate constants calculated for each temperature. Frequencies monitored for CF3NO2 were 1604 cm-1, 865 cm-1, and 747 cm-1. Frequencies for CF2O were 1908 cm-1 and 1942 cm-1. Energies of adsorption were calculated for both compounds.